[CVD I]

- IV (Si,Ge) semiconductors

- Gas cabinets (top right) with gas-leak detector & automatic valve shutters

- Gas scrubber (Bottom right)

[MOCVD system]

- II-VI oxide semiconductors

- ZnO nanorods and nanomaterials

[CVD II]

- III-V semiconductors

- Gas cabinets (right)                                              

[Evaporator]

- metal deposition

[CVD III]

- Carbon based materials  synthesis

[RTA]

- Thermal annealing

[Plasma etcher]

- Oxygen plasma etcher

[Optical microscopy]

- Olympus BX51

[Electrical measurement system I]

- Probe station

- Semiconductor parameter analyzer

[Electrical measurement system II]

- DAQ

- Picoammeter

- Voltage amp./bipolar power supply

[Electron beam lithography system]

- NPGS

- SEM (MSE facility)

[Optical measurement system]